.tantalum target
Shenzhen Sunrise Metal Industry Co.,Ltd
TEL:0086-0755-27185042
Website:http://www.sunriseta.com
E-Mail:sales@sunriseta.com
Related Product Searches:tantal plate .tantalum targets,High Quality,tantal target , tantal disc tantal target material : Ta1 size : dia.15mm x 2mm density : < 16.65g/cm3 Website:http://www.sunriseta.com
E-Mail:sales@sunriseta.com
tantal bar
material : Ta1
purity : 99.95%
density : 16.65g/cm3
melting point : 2996degree "C"
feature : tantalum is one of refractory metal , It has good properties of corrosion resistance and electrical conductivity .It easy be processed in the normal temperation . The usage of tantalum material is in electrical industy .
If you need tantal alloy such as Ta10W , Ta2.5W , Ta40 Nb , also can contact us ,we will give you our feedback in a short time .
tantal plate .tantalum targets
Product Specification/Models
D(40-50)mm*T(3-28)mm
Recrystallization:99.95%
Crystal degree:40 micron meter
surface roughness:Ra 0.4
roughness: 0.10% 0.1mm
diameter tolerance:±0.254mm
Special requirements are agreed between the parties.
D(40-50)mm*T(3-28)mm
Recrystallization:99.95%
Crystal degree:40 micron meter
surface roughness:Ra 0.4
roughness: 0.10% 0.1mm
diameter tolerance:±0.254mm
Special requirements are agreed between the parties.
Application
Tantalum target material is a very important aspect in thin film technology. Its final purity is more than 99.95%,the final grain size is so small, the consistent state of recrystal microstructure and three axial positions is very good. As oxidation film from cathode sputtering target materials is evenly, do not react with other substances in the air, the protection effect of it is lasting .Tantalum sputtering target materials has been widely used in fiber optics, semiconductor chip integrated circuit and military areas. Tantalum-projectile has been in development successfully.
Tantalum target material is a very important aspect in thin film technology. Its final purity is more than 99.95%,the final grain size is so small, the consistent state of recrystal microstructure and three axial positions is very good. As oxidation film from cathode sputtering target materials is evenly, do not react with other substances in the air, the protection effect of it is lasting .Tantalum sputtering target materials has been widely used in fiber optics, semiconductor chip integrated circuit and military areas. Tantalum-projectile has been in development successfully.
Payment
T/T,L/C
T/T,L/C


















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